Surface Effects of Passivation within Mo/4H-SiC Schottky Diodes through MOS Analysis (2019)
Attributed to:
Multi-User Equipment to Refresh Underpinning Analytical Capabilities at the University of Warwick
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.4028/www.scientific.net/msf.963.511
Publication URI: http://dx.doi.org/10.4028/www.scientific.net/msf.963.511
Type: Journal Article/Review
Parent Publication: Materials Science Forum