Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays. (2020)
Attributed to:
Manufacturing of nano-engineered III-N semiconductors: Equipment Business Case
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1038/s41598-020-62539-1
PubMed Identifier: 32221397
Publication URI: http://europepmc.org/abstract/MED/32221397
Type: Journal Article/Review
Volume: 10
Parent Publication: Scientific reports
Issue: 1
ISSN: 2045-2322