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Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays. (2020)

First Author: Coulon PM

Attributed to: Future Compound Semiconductor Manufacturing Hub funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1038/s41598-020-62539-1

PubMed Identifier: 32221397

Publication URI: http://europepmc.org/abstract/MED/32221397

Type: Journal Article/Review

Volume: 10

Parent Publication: Scientific reports

Issue: 1

ISSN: 2045-2322