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Optical Emission Imaging and Modeling Investigations of Microwave-Activated SiH4/H2 and SiH4/CH4/H2 Plasmas. (2020)

First Author: Mahoney EJD

Attributed to: Metrology concepts for a new generation of plasma manufacturing with atom-scale precision funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpca.0c03396

PubMed Identifier: 32475115

Publication URI: http://europepmc.org/abstract/MED/32475115

Type: Journal Article/Review

Volume: 124

Parent Publication: The journal of physical chemistry. A

Issue: 25

ISSN: 1089-5639