Optical Emission Imaging and Modeling Investigations of Microwave-Activated SiH4/H2 and SiH4/CH4/H2 Plasmas. (2020)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpca.0c03396
PubMed Identifier: 32475115
Publication URI: http://europepmc.org/abstract/MED/32475115
Type: Journal Article/Review
Volume: 124
Parent Publication: The journal of physical chemistry. A
Issue: 25
ISSN: 1089-5639