Effect of electric field on defect generation and migration in HfO 2 (2020)
Attributed to:
Resistive switches (RRAM) and memristive behaviour in silicon-rich silicon oxides
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1103/physrevb.102.014106
Publication URI: http://dx.doi.org/10.1103/physrevb.102.014106
Type: Journal Article/Review
Parent Publication: Physical Review B
Issue: 1