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Comparison of Conventional and Maskless Lithographic Techniques for More than Moore Post-Processing of Foundry CMOS Chips (2020)

First Author: Tsiamis A

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/jmems.2020.3015964

Publication URI: http://dx.doi.org/10.1109/jmems.2020.3015964

Type: Journal Article/Review

Parent Publication: Journal of Microelectromechanical Systems

Issue: 5