Diamond chemical vapor deposition using a zero-total gas flow environment (2020)
Attributed to:
Metrology concepts for a new generation of plasma manufacturing with atom-scale precision
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.diamond.2020.108011
Publication URI: http://dx.doi.org/10.1016/j.diamond.2020.108011
Type: Journal Article/Review
Parent Publication: Diamond and Related Materials