Polarity dependence in Cl2-based plasma etching of GaN, AlGaN and AlN (2020)

First Author: Smith M
Attributed to:  Materials and Devices for Next Generation Internet (MANGI) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2020.146297

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2020.146297

Type: Journal Article/Review

Parent Publication: Applied Surface Science