Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks (2020)

First Author: Chaker A
Attributed to:  Manufacturing at the 7nm node and beyond enabled by novel resist technology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsanm.0c02756

Publication URI: http://dx.doi.org/10.1021/acsanm.0c02756

Type: Journal Article/Review

Parent Publication: ACS Applied Nano Materials

Issue: 1