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Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN (2020)

First Author: Shi X

Attributed to: Quantum Electronics Device Modelling (QUANTDEVMOD) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.33079/jomm.20030407

Publication URI: http://dx.doi.org/10.33079/jomm.20030407

Type: Journal Article/Review

Parent Publication: Journal of Microelectronic Manufacturing

Issue: 4