Low temperature (<100°C) deposited P-type cuprous oxide thin films: Importance of controlled oxygen and deposition energy (2011)

First Author: Li F

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2011.04.192

Publication URI: http://dx.doi.org/10.1016/j.tsf.2011.04.192

Type: Journal Article/Review

Parent Publication: Thin Solid Films

Issue: 4