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Modeling of Diffusion and Incorporation of Interstitial Oxygen Ions at the TiN/SiO2 Interface. (2019)

First Author: Cottom J

Attributed to: HIGH END COMPUTING MATERIALS CHEMISTRY CONSORTIUM funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsami.9b10705

PubMed Identifier: 31532611

Publication URI: http://europepmc.org/abstract/MED/31532611

Type: Journal Article/Review

Volume: 11

Parent Publication: ACS applied materials & interfaces

Issue: 39

ISSN: 1944-8244