Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements (2019)
Attributed to:
ZnO MESFETs for application to Intelligent Windows
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2019.111113
Publication URI: http://dx.doi.org/10.1016/j.mee.2019.111113
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering