Characteristics of Ni/AlO x /Pt RRAM devices with various dielectric fabrication temperatures (2019)

First Author: Shen Z

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/icicdt.2019.8790838

Publication URI: http://dx.doi.org/10.1109/icicdt.2019.8790838

Type: Conference/Paper/Proceeding/Abstract