Effects of biased irradiation on charge trapping in HfO2 dielectric thin films (2017)
Attributed to:
High permittivity dielectrics on Ge for end of Roadmap application
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4999899
Publication URI: http://dx.doi.org/10.1063/1.4999899
Type: Conference/Paper/Proceeding/Abstract