Thermal and oxidation stability of Ti x W1- x diffusion barriers investigated by soft and hard x-ray photoelectron spectroscopy (2021)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/5.0048304
Publication URI: http://dx.doi.org/10.1063/5.0048304
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 19