High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography (2021)

First Author: Kabouraki E

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1515/nanoph-2021-0263

Publication URI: http://dx.doi.org/10.1515/nanoph-2021-0263

Type: Journal Article/Review

Parent Publication: Nanophotonics

Issue: 14