High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography (2021)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1515/nanoph-2021-0263
Publication URI: http://dx.doi.org/10.1515/nanoph-2021-0263
Type: Journal Article/Review
Parent Publication: Nanophotonics
Issue: 14