Ordered GaAs quantum dots by droplet epitaxy using in situ direct laser interference patterning (2021)
Attributed to:
In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/5.0045817
Publication URI: http://dx.doi.org/10.1063/5.0045817
Type: Journal Article/Review
Parent Publication: Applied Physics Letters
Issue: 14