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Ordered GaAs quantum dots by droplet epitaxy using in situ direct laser interference patterning (2021)

First Author: Han I

Attributed to: In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/5.0045817

Publication URI: http://dx.doi.org/10.1063/5.0045817

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 14