Tungsten disulfide thin films via electrodeposition from a single source precursor. (2021)
Attributed to:
ADEPT - Advanced Devices by ElectroPlaTing
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1039/d1cc03297f
PubMed Identifier: 34519740
Publication URI: http://europepmc.org/abstract/MED/34519740
Type: Journal Article/Review
Volume: 57
Parent Publication: Chemical communications (Cambridge, England)
Issue: 79
ISSN: 1359-7345