Tungsten disulfide thin films via electrodeposition from a single source precursor. (2021)

First Author: Thomas S
Attributed to:  ADEPT - Advanced Devices by ElectroPlaTing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/d1cc03297f

PubMed Identifier: 34519740

Publication URI: http://europepmc.org/abstract/MED/34519740

Type: Journal Article/Review

Volume: 57

Parent Publication: Chemical communications (Cambridge, England)

Issue: 79

ISSN: 1359-7345