Effect of Plasma Treatment on Metal Oxide p-n Thin Film Diodes Fabricated at Room Temperature (2021)

First Author: Khong Y
Attributed to:  The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/admi.202100049

Publication URI: http://dx.doi.org/10.1002/admi.202100049

Type: Journal Article/Review

Parent Publication: Advanced Materials Interfaces

Issue: 10