Defects and Passivation Mechanism of the Suboxide Layers at SiO2/4H-SiC (0001) Interface: A First-Principles Calculation (2021)
Attributed to:
Integration of Novel Materials in Spintronic Devices
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/ted.2020.3039480
Publication URI: http://dx.doi.org/10.1109/ted.2020.3039480
Type: Journal Article/Review
Parent Publication: IEEE Transactions on Electron Devices
Issue: 1