Optimal edge termination for high oxide reliability aiming 10kV SiC n-IGBTs (2019)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/demped.2019.8864919
Publication URI: http://dx.doi.org/10.1109/demped.2019.8864919
Type: Conference/Paper/Proceeding/Abstract