A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films (2022)

First Author: Fang Y
Attributed to:  ZnO MESFETs for application to Intelligent Windows funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.radphyschem.2021.109899

Publication URI: http://dx.doi.org/10.1016/j.radphyschem.2021.109899

Type: Journal Article/Review

Parent Publication: Radiation Physics and Chemistry