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Optical dielectric properties of HfO2-based films (2022)

First Author: Dou H

Attributed to: ECCS - EPSRC Development of uniform, low power, high density resistive memory by vertical interface and defect design funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/6.0001651

Publication URI: http://dx.doi.org/10.1116/6.0001651

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology A

Issue: 3