Optical dielectric properties of HfO2-based films (2022)
Attributed to:
ECCS - EPSRC Development of uniform, low power, high density resistive memory by vertical interface and defect design
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1116/6.0001651
Publication URI: http://dx.doi.org/10.1116/6.0001651
Type: Journal Article/Review
Parent Publication: Journal of Vacuum Science & Technology A
Issue: 3