Plasma enhanced chemical vapor deposition of p-type Cu2O from metal organic precursors (2022)

First Author: Gomersall D

Attributed to: Precision Manufacturing of Flexible CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/5.0089757

Publication URI: http://dx.doi.org/10.1063/5.0089757

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 21