Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography (2022)
Attributed to:
Molecular assembly of spintronic circuits with DNA
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adfm.202202710
Publication URI: http://dx.doi.org/10.1002/adfm.202202710
Type: Journal Article/Review
Parent Publication: Advanced Functional Materials
Issue: 32