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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography (2022)

First Author: Lewis S

Attributed to: Manufacturing at the 7nm node and beyond enabled by novel resist technology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/adfm.202202710

Publication URI: http://dx.doi.org/10.1002/adfm.202202710

Type: Journal Article/Review

Parent Publication: Advanced Functional Materials

Issue: 32