Direct Writing Unclonable Watermarks with an Electrochemical Jet (2022)
Attributed to:
Eradicating hydrofluoric acid from metal etching
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adfm.202208116
Publication URI: http://dx.doi.org/10.1002/adfm.202208116
Type: Journal Article/Review
Parent Publication: Advanced Functional Materials
Issue: 51