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Facilitating Uniform Large-Scale MoS 2 , WS 2 Monolayers, and Their Heterostructures through van der Waals Epitaxy (2022)

First Author: Huang C

Attributed to: National Hub in High Value Photonic Manufacturing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsami.2c12174

PubMed Identifier: 36082455

Publication URI: http://europepmc.org/abstract/MED/36082455

Type: Journal Article/Review

Parent Publication: ACS Applied Materials & Interfaces

Issue: 37

ISSN: 1944-8244