Facilitating Uniform Large-Scale MoS2, WS2 Monolayers, and Their Heterostructures through van der Waals Epitaxy. (2022)

First Author: Huang CC
Attributed to:  National Hub in High Value Photonic Manufacturing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsami.2c12174

PubMed Identifier: 36082455

Publication URI: http://europepmc.org/abstract/MED/36082455

Type: Journal Article/Review

Volume: 14

Parent Publication: ACS applied materials & interfaces

Issue: 37

ISSN: 1944-8244