Negative Tone Metallic Organic Resists with Improved Sensitivity for Plasma Etching: Implications for Silicon Nanostructure Fabrication and Photomask Production. (2022)

First Author: Chaker A
Attributed to:  Manufacturing at the 7nm node and beyond enabled by novel resist technology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsanm.2c02986

PubMed Identifier: 36583125

Publication URI: http://europepmc.org/abstract/MED/36583125

Type: Journal Article/Review

Volume: 5

Parent Publication: ACS applied nano materials

Issue: 12

ISSN: 2574-0970