Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study (2022)

First Author: Noakes T

Attributed to: Cockcroft Phase 4 funded by STFC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.vacuum.2022.111424

Publication URI: http://dx.doi.org/10.1016/j.vacuum.2022.111424

Type: Journal Article/Review

Parent Publication: Vacuum