Modelling the interactions and diffusion of NO in amorphous SiO 2 (2021)

First Author: Mistry M
Attributed to:  HIGH END COMPUTING MATERIALS CHEMISTRY CONSORTIUM funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/1361-651x/abdc69

Publication URI: http://dx.doi.org/10.1088/1361-651x/abdc69

Type: Journal Article/Review

Parent Publication: Modelling and Simulation in Materials Science and Engineering

Issue: 3