High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO 2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity (2023)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adma.202301204
Publication URI: http://dx.doi.org/10.1002/adma.202301204
Type: Journal Article/Review
Parent Publication: Advanced Materials
Issue: 25