High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity. (2023)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adma.202301204
PubMed Identifier: 37043671
Publication URI: http://europepmc.org/abstract/MED/37043671
Type: Journal Article/Review
Volume: 35
Parent Publication: Advanced materials (Deerfield Beach, Fla.)
Issue: 25
ISSN: 0935-9648