High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO 2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity (2023)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/adma.202301204

Publication URI: http://dx.doi.org/10.1002/adma.202301204

Type: Journal Article/Review

Parent Publication: Advanced Materials

Issue: 25