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High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low Defectivity. (2023)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/adma.202301204

PubMed Identifier: 37043671

Publication URI: http://europepmc.org/abstract/MED/37043671

Type: Journal Article/Review

Volume: 35

Parent Publication: Advanced materials (Deerfield Beach, Fla.)

Issue: 25

ISSN: 0935-9648