Atomistic insights into bias-induced oxidation on passivated silicon surface through ReaxFF MD simulation (2023)
Attributed to:
A Multiscale Digital Twin-Driven Smart Manufacturing System for High Value-Added Products
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2023.157253
Publication URI: http://dx.doi.org/10.1016/j.apsusc.2023.157253
Type: Journal Article/Review
Parent Publication: Applied Surface Science