Atomistic insights into bias-induced oxidation on passivated silicon surface through ReaxFF MD simulation (2023)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2023.157253

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2023.157253

Type: Journal Article/Review

Parent Publication: Applied Surface Science