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Effect of Substrate Temperature on Morphological, Structural, and Optical Properties of Doped Layer on SiO2-on-Silicon and Si3N4-on-Silicon Substrate (2022)

First Author: Kamil S

Attributed to: Ultrafast Laser Plasma Implantation- Seamless Integration of Functional Materials for Advanced Photonics funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.3390/nano12060919

PubMed Identifier: 35335732

Publication URI: http://europepmc.org/abstract/MED/35335732

Type: Journal Article/Review

Parent Publication: Nanomaterials

Issue: 6

ISSN: 2079-4991