Effect of Substrate Temperature on Morphological, Structural, and Optical Properties of Doped Layer on SiO2-on-Silicon and Si3N4-on-Silicon Substrate. (2022)
Attributed to:
Ultrafast Laser Plasma Implantation- Seamless Integration of Functional Materials for Advanced Photonics
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.3390/nano12060919
PubMed Identifier: 35335732
Publication URI: http://europepmc.org/abstract/MED/35335732
Type: Journal Article/Review
Volume: 12
Parent Publication: Nanomaterials (Basel, Switzerland)
Issue: 6
ISSN: 2079-4991