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Hydrogen resist lithography and electron beam lithography for fabricating silicon targets for studying donor orbital states (2018)

First Author: Crane E

Attributed to: Atomically Deterministic Doping and Readout For Semiconductor Solotronics (ADDRFSS) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/1742-6596/1079/1/012010

Publication URI: https://api.elsevier.com/content/abstract/scopus_id/85054474611

Type: Journal Article/Review

Parent Publication: Journal of Physics: Conference Series