Sub-picosecond 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxide thin films (2022)
Attributed to:
Manufacturing with Light 2: Lasers Making Lasers
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1117/1.oe.61.7.071603
Publication URI: https://api.elsevier.com/content/abstract/scopus_id/85132074959
Type: Journal Article/Review
Parent Publication: Optical Engineering
Issue: 07