The Role of Selective Pattern Etching to Improve the Ohmic Contact Resistance and Device Performance of AlGaN/GaN HEMTs (2021)

First Author: Dhongde A.
Attributed to:  Novel GaN Power Devices and Packaging Technologies for 300 degC Ambient Operation funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Publication URI: https://api.elsevier.com/content/abstract/scopus_id/85126101638

Type: Journal Article/Review

Volume: 14

Parent Publication: International Journal of Nanoelectronics and Materials

Issue: Special Issue InCAPE

ISSN: 22321535 19855761