Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography (2022)

First Author: Lewis S
Attributed to:  Manufacturing at the 7nm node and beyond enabled by novel resist technology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1117/1.jmm.21.4.041404

Publication URI: https://api.elsevier.com/content/abstract/scopus_id/85147548058

Type: Journal Article/Review

Parent Publication: Journal of Micro/Nanopatterning, Materials, and Metrology

Issue: 04