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Design and implementation of the next generation electron beam resists for the production of EUVL photomasks (2018)

First Author: Lewis S

Attributed to: Manufacturing at the 7nm node and beyond enabled by novel resist technology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1117/12.2501808

Publication URI: https://api.elsevier.com/content/abstract/scopus_id/85058332805

Type: Conference/Paper/Proceeding/Abstract