Modeling of interference microscopy beyond the linear regime (2020)
Attributed to:
Metrology for precision and additive manufacturing
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1117/1.oe.59.3.034110
Publication URI: https://api.elsevier.com/content/abstract/scopus_id/85082998241
Type: Journal Article/Review
Parent Publication: Optical Engineering
Issue: 03