Multi-pulse atomic layer deposition of p-type SnO thin films: growth processes and the effect on TFT performance (2023)
Attributed to:
The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1039/d3tc00255a
Publication URI: http://dx.doi.org/10.1039/d3tc00255a
Type: Journal Article/Review
Parent Publication: Journal of Materials Chemistry C
Issue: 17