Focused ion beam lithography for position-controlled nanowire growth. (2023)

First Author: Mosberg AB
Attributed to:  SuperSTEM: National Research Facility for Advanced Electron Microscopy funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/1361-6528/acd2e1

PubMed Identifier: 37146597

Publication URI: http://europepmc.org/abstract/MED/37146597

Type: Journal Article/Review

Volume: 34

Parent Publication: Nanotechnology

Issue: 33

ISSN: 0957-4484