Doping Density Extraction of Plasma Treated Metal Oxide Thin Film Diodes by Capacitance-Voltage Analysis (2023)

First Author: Khong Y
Attributed to:  The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/admi.202202359

Publication URI: http://dx.doi.org/10.1002/admi.202202359

Type: Journal Article/Review

Parent Publication: Advanced Materials Interfaces

Issue: 17