Hafnium oxide: A thin film dielectric with controllable etch resistance for semiconductor device fabrication (2023)

First Author: Wratten A
Attributed to:  Computational spectral imaging in the THz band funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/5.0144639

Publication URI: http://dx.doi.org/10.1063/5.0144639

Type: Journal Article/Review

Parent Publication: AIP Advances

Issue: 6